제품소개
Coater
특징
1. SEM 관찰 시의 Charge Up방지에 최적한 전처리 장치
2. Ion Damage을 경감하는 Sputter 기능을 표준 탑제
3. 시료제작의 초간단화 및 Compact Model
(W160*D326*H286mm)
(W160*D326*H286mm)
|
SPEC |
|
|
Standard Target |
49mm dia./AuX1 |
|
Sample Base |
50min dia(T-S adjustment range 20, 30, 40 mm) |
|
Sputtering System |
DC Sputtering/Parallel-plate type |
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Intermitted Sputtering Model & Timer |
Duty cycle 20% / 0 – 15min (Max. 30min) |
|
High Voltage Power Supply |
1.2kV/0 – 9.9mA |
|
Chamber Size |
90(dia.) * 90(depth)mm (SUS) |
|
Dimensions and Weight |
Min unit : 160(W) * 326(D) * 286(H)mm, 10Kg RP : 295.5(W) * 156(D) * 199.5(H)mm, 9Kg |
Power Supply | Single Phase AC 100V +-10% 50/60Hz 7A |
Option Targets | Ag, Pt, Pd, Au-Pd, Pt-Pd |