제품소개
Coater
특징
1. 대형 기판의 전면 Coating에 대응한 Ion Sputtering 장치
2. Target는 4~8inch를 1inch 단위로 구별된 Size를 준비
3. Sputter 박막 제작, Micro Channel 유로 형성 시의 P은 표면처리에도 대응
4. Coating Mode/Etching Mode 탑재
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SPEC |
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Standard Target & Sample Base |
4~8inch dia. |
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Sputtering System |
DC Sputtering/Parallel-plate type |
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Chamber Size |
240(dia.) X 240(depth)mm(made of stainless steel) |
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High Voltage Power Supply |
0.8, 1.4kV/0~20mA |
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Degree of vacuum & Timmer |
8Pa / 0 -15 min continuous |
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Rotary pump |
Directly-connected rotary pump 100L/min(with automatic leaking system) |
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Power Supply |
Single Phase AC 100V 50/60Hz 10A |
| Dimensions and Weight | Main unit : 282(W) X 450(D) X 440(H)mm, 20kg RP : 460(W) X 450(D) X 440(H)mm, 22kg |