SPEC |
|
Target size & Sample Base |
Φ49mm / Φ70mm |
Operation of evacuation |
Automatic |
Sputtering System | DC Magnetron Sputtering |
High Voltage Power Supply |
0~5mA/0~3kV(system control) |
Gas regulating mechanism |
Needle valve(system control) |
Chamber Size |
160(Φ) X 160(D)mm (SUS) |
Dimensions and Weight |
Main unit : 360(W) X 422(D) X 265(H)mm, 20kg RP : 460.5(W) X 173.5(D) X 264(H)mm, 22.4kg |
Power Supply | Single Phase AC 100V 50/60Hz 10A |